Plasma polymer process for microfluidic devices fabrication

Abdennour Abbas (1) , Bertrand Bocquet (1) , Nour Eddine Bourzgui (1) , Céline Vivien (2) , Phillipe Supiot (3)

1 IEMN - Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520
2 GéPIFRéM - Laboratoire de Génie des Procédés d'Interactions Fluides Réactifs-Matériaux - EA 3571
3 Génie des Procédés d'Interaction Fluide Réactifs et Matériaux

Plasma polymerization, so called Remote Plasma Enhanced Chemical Vapour Deposition (RPECVD) has been increasingly used in microsystems field. Plasma polymers served primarily as supports for electronic sensors or carriers for biomolecules and cell attachment. This work describes the first use of plasma thin film deposition for the easy, fast and reduced cost fabrication of microfluidic channels. A new method named “plasma polymerization on a micropatterned surface” (PPMS) is presented.

Mots clés: Microfabrication; plasma polymerization; microfluidic microsystem; plasma polymer; microchannel; thin films; PPSL; PPMS; organisilicon; TMDS; Tetramethyldisiloxane

Domaines: Science des matériaux [cond-mat.mtrl-sci]

Abdennour Abbas, Bertrand Bocquet, Nour Eddine Bourzgui, Céline Vivien, Phillipe Supiot. Plasma polymer process for microfluidic devices fabrication. IEEE 36th International Conference on Plasma Science, May 2009, San Diego, California, United States. ⟨hal-00443649⟩