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Impact of the etching gas on vertically oriented single wall and few walled carbon nanotubes by plasma enhanced chemical vapor deposition

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https://hal.archives-ouvertes.fr/hal-00391948
Contributor : Richard Baschera <>
Submitted on : Friday, June 5, 2009 - 11:10:00 AM
Last modification on : Wednesday, July 11, 2018 - 6:06:05 PM

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A. Gohier, T.M. Minea, M. A. Djouadi, Agnès Granier. Impact of the etching gas on vertically oriented single wall and few walled carbon nanotubes by plasma enhanced chemical vapor deposition. Journal of Applied Physics, American Institute of Physics, 2007, 101 (5), pp.054317. ⟨10.1063/1.2654647⟩. ⟨hal-00391948⟩

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