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Conference papers

Deposition and its characterizations of aluminium nitride thin film on Si(100) by RMPECVD

A.M. Wu Pascal Tristant 1 Christelle Dublanche-Tixier 1 H. Hidalgo G.Q. Lin C. Dong
1 Axe 2 : procédés de traitements de surface
SPCTS - Science des Procédés Céramiques et de Traitements de Surface
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Conference papers
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https://hal.archives-ouvertes.fr/hal-00366074
Contributor : Martine Segear Connect in order to contact the contributor
Submitted on : Thursday, March 5, 2009 - 4:19:34 PM
Last modification on : Saturday, March 26, 2022 - 4:27:19 AM

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  • HAL Id : hal-00366074, version 1

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A.M. Wu, Pascal Tristant, Christelle Dublanche-Tixier, H. Hidalgo, G.Q. Lin, et al.. Deposition and its characterizations of aluminium nitride thin film on Si(100) by RMPECVD. MRS International Materials Research Conference, IMRC 2008, Jun 2008, Chongqing, China. ⟨hal-00366074⟩

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