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Elaboration et caractérisations de films ferroélectriques relaxeurs de PMN-PT : intégration sur silicium et applications MEMS

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https://hal.archives-ouvertes.fr/hal-00362347
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Submitted on : Wednesday, February 18, 2009 - 8:31:16 AM
Last modification on : Wednesday, March 23, 2022 - 3:50:22 PM

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  • HAL Id : hal-00362347, version 1

Citation

M. Detalle. Elaboration et caractérisations de films ferroélectriques relaxeurs de PMN-PT : intégration sur silicium et applications MEMS. 2008. ⟨hal-00362347⟩

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