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Conference papers

Characterization of in-IC integrable in-plane nanometer scale resonators fabricated by a silicon on nothing advanced CMOS technology

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https://hal.archives-ouvertes.fr/hal-00361112
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Submitted on : Friday, February 13, 2009 - 9:59:58 AM
Last modification on : Wednesday, March 23, 2022 - 3:50:22 PM

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C. Durand, F. Casset, Bernard Legrand, M. Faucher, P. Renaux, et al.. Characterization of in-IC integrable in-plane nanometer scale resonators fabricated by a silicon on nothing advanced CMOS technology. 21st IEEE International Conference on Micro Electro Mechanical Systems, MEMS 2008, 2008, United States. pp.1016-1019, ⟨10.1109/MEMSYS.2008.4443831⟩. ⟨hal-00361112⟩

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