Anomalous diffusion mediated by atom deposition into a porous substrate.

Pascal Brault (1) , Christophe Josserand (2) , Jean-Marc Bauchire (1) , Amaël Caillard (1) , Christine Charles (3) , Rod W. Boswell (3)

1 GREMI - Groupe de recherches sur l'énergétique des milieux ionisés
2 LMM - Laboratoire de modélisation en mécanique
3 SP3 - Space, Plasma, Power, Propulsion group

Constant flux atom deposition into a porous medium is shown to generate a dense overlayer and a diffusion profile. Scaling analysis shows that the overlayer acts as a dynamic control for atomic diffusion in the porous substrate. This is modeled by generalizing the porous diffusion equation with a time-dependent diffusion coefficient equivalent to a nonlinear rescaling of time.

Domaines: Plasmas

Pascal Brault, Christophe Josserand, Jean-Marc Bauchire, Amaël Caillard, Christine Charles, et al.. Anomalous diffusion mediated by atom deposition into a porous substrate.. Physical Review Letters, 2009, 102, pp.045901. ⟨10.1103/PhysRevLett.102.045901⟩. ⟨hal-00355521⟩