Characterization of sputtering deposited NiTi shape memory thin films using a temperature controllable atomic force microscope

Q. He , Wei-Min Huang , Ming-Jie Wu (1) , M.-H. Hong , Y.-Q. Fu , Franck Chollet (1) , H.-J. Du

1 MMC - MicroMachines Centre

NiTi shape memory thin films are potentially desirable for micro-electro-mechanical system (MEMS) actuators, because they have a much higher work output per volume and also a significantly improved response speed due to a larger surface-to-volume ratio. A new technique using a temperature controllable atomic force microscope (AFM) is presented in order to find the transformation temperatures of NiTi shape memory thin films of micrometer size, since traditional techniques, such as differential scanning calorimetry (DSC) and the curvature method, have difficulty in dealing with samples of such a scale as this. This technique is based on the surface relief phenomenon in shape memory alloys upon thermal cycling. The reliability of this technique is investigated and compared with the DSC result in terms of the transformation fraction (ξ ). It appears that the new technique is nondestructive, in situ and capable of characterizing sputtering deposited very small NiTi shape memory thin films.

Domaines: Micro et nanotechnologies/Microélectronique; Matériaux et structures en mécanique [physics.class-ph]; Matériaux et structures en mécanique [physics.class-ph]

Q. He, Wei-Min Huang, Ming-Jie Wu, M.-H. Hong, Y.-Q. Fu, et al.. Characterization of sputtering deposited NiTi shape memory thin films using a temperature controllable atomic force microscope. Smart Materials and Structures, 2004, 13, pp.977-982. ⟨hal-00340825⟩