Effect of temperature calibration up to 500 °C on Fe/Si thin films thermal characterisation by pulsed photo-thermal method - Archive ouverte HAL Accéder directement au contenu
Communication Dans Un Congrès Année : 2007

Effect of temperature calibration up to 500 °C on Fe/Si thin films thermal characterisation by pulsed photo-thermal method

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hal-00336107 , version 1 (31-10-2008)

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  • HAL Id : hal-00336107 , version 1

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Nadjib Semmar, Cong Wang, Pascal Brault. Effect of temperature calibration up to 500 °C on Fe/Si thin films thermal characterisation by pulsed photo-thermal method. EMR 20008 : Symposium B: Laser and plasma in micro- and nano-scale materials processing and diagnostics, Jun 2008, Strasbourg, France. B-P3 51 p. 69. ⟨hal-00336107⟩
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