Structuring of self-assembled three-dimensional photonic crystals by electron-beam lithography

P. Ferrand 1 M. Egen 2 R. Zentel 2 J. Seekamp 1 S. G. Romanov 1 C. M. Sotomayor Torres 1
1 Institute of Materials Engineering
2 Institute for Organic Chemistry
Abstract : An electron-beam lithography technique is described capable of structuring three-dimensional self-assembled photonic crystals. It is shown that the control of the writing depth can be achieved by varying the electron acceleration voltage. Microscopic structures with a depth from 0.4 up to 2 micrometers are fabricated with a typical lateral resolution of 0.4 micrometers. The relevance of this technique for the fabrication of deterministic defects sites in opal photonic crystals is discussed and its extension towards buried structures is suggested.
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https://hal.archives-ouvertes.fr/hal-00272373
Contributeur : Patrick Ferrand <>
Soumis le : mercredi 15 avril 2015 - 11:23:53
Dernière modification le : mercredi 24 avril 2019 - 09:38:06
Archivage à long terme le : mardi 18 avril 2017 - 19:45:33

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P. Ferrand, M. Egen, R. Zentel, J. Seekamp, S. G. Romanov, et al.. Structuring of self-assembled three-dimensional photonic crystals by electron-beam lithography. Applied Physics Letters, American Institute of Physics, 2003, 83 (25), pp.5289-5291. ⟨10.1063/1.1636271⟩. ⟨hal-00272373⟩

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