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Article Dans Une Revue Microelectronic Engineering Année : 2004

Direct electron-beam lithography on opal films for deterministic defect fabrication in three-dimensional photonic crystals

Résumé

The deterministic fabrication of microscopic structures in self-assembled three-dimensional (3D) photonic crystals is reported. Microscopic 1 μm deep controlled structures, cavities with width as small as 5 μm and trenches as narrow as 2 μm, been fabricated using direct electron-beam writing on a poly(methyl methacrylate) (PMMA) opal film. The technique is highly accurate, versatile and is probably suitable to fabricate buried defects.
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hal-00272371 , version 1 (29-09-2015)

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Patrick Ferrand, J. Seekamp, M. Egen, R. Zentel, S. G. Romanov, et al.. Direct electron-beam lithography on opal films for deterministic defect fabrication in three-dimensional photonic crystals. Microelectronic Engineering, 2004, 73-74, pp.362-366. ⟨10.1016/j.mee.2004.02.068⟩. ⟨hal-00272371⟩
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