Flow property measurement for nanoimprint simulation

Tanguy Lévéder (1, 2) , Stéfan Landis (1, 2) , Laurent Davoust (3) , Nicolas Chaix (4)

1 CEA-LETI - Commissariat à l'énergie atomique et aux énergies alternatives - Laboratoire d'Electronique et de Technologie de l'Information
2 D2NT - Département Nanotec
3 LEGI - Laboratoire des Écoulements Géophysiques et Industriels [Grenoble]
4 LTM - Laboratoire des technologies de la microélectronique

Number of recent works report that viscoelastic properties of ultra-thin polymer film (below 100 nm) could drastically change from bulk values, deeply impacting nanoimprint process simulation. A good knowledge of thin resist film viscosity is thus needed, either for UV imprint, or thermal imprint. Nanoimprint lithography has been used to characterize sub 100 nm resist film flow properties above glass transition temperature. Specifically designed stamps have been manufactured to control silicon etched lines motion into the melt polymer. Adapted fluid modelling is proposed to calculate dynamic viscosity of thin polymer film for different temperatures from experimental data. Good agreements between ours results and literature were found.

Mots clés: Nanoimprint lithography; Thermal imprint; Flow properties

Domaines: Mécanique des fluides [physics.class-ph]; Mécanique des fluides [physics.class-ph]

Tanguy Lévéder, Stéfan Landis, Laurent Davoust, Nicolas Chaix. Flow property measurement for nanoimprint simulation. Microelectronic Engineering, 2007, 84 (5-8), pp.928-931. ⟨10.1016/j.mee.2007.01.065⟩. ⟨hal-00266796⟩