On the measurement by EDX of diffusion profiles of Ni/Cu assemblies

Abstract : To characterise (inter)diffusion in materials, concentration profiles can be measured by EDX. It allows one to determine the chemical composition with a very good accuracy if measurement artefacts are accounted for. Standard phenomena (such as X-ray fluorescence) are usually corrected by commercial software. However, the effect of the pear-shaped volume of X-ray emission on the concentration profiles has to be considered. The paper describes the origin of this artefact, its consequences on measurements and will provide a practical solution (based on signal processing methods) to deconvolute the actual concentration profiles (or the diffusion coefficient) from the raw measurements.
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Submitted on : Thursday, December 20, 2007 - 11:10:27 PM
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  • HAL Id : hal-00200457, version 1
  • ARXIV : 0712.3636


Olivier Arnould, François Hild. On the measurement by EDX of diffusion profiles of Ni/Cu assemblies. Microscopy and Microanalysis, Cambridge University Press (CUP), 2000, European Edition, pp.13-15. ⟨hal-00200457⟩



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