Metallic Polycrystalline Thin Films of the Single-Component Neutral Molecular Solid Ni(tmdt)2

Isabelle Malfant (1) , Klauss Rivasseau (1) , Jordi Fraxedas (2) , C. Faulmann (1) , Dominique de Caro (1) , Lydie Valade (1) , Lakhemici Kaboub (3) , Jean-Marc Fabre (3) , Francois Senocq (4)

1 LCC - Laboratoire de chimie de coordination
2 ICMAB - Institut de Ciència de Materials de Barcelona
3 ICGM ICMMM - Institut Charles Gerhardt Montpellier - Institut de Chimie Moléculaire et des Matériaux de Montpellier
4 CIRIMAT - Centre interuniversitaire de recherche et d'ingenierie des matériaux

Metallic thin films of the single-component, neutral, molecular solid Ni(tmdt)2 have been prepared by electrocrystallization on passivated silicon substrates. Metallicity is achieved down to 6 K despite the polycrystalline morphology.

Domaines: Matériaux; Chimie de coordination

Isabelle Malfant, Klauss Rivasseau, Jordi Fraxedas, C. Faulmann, Dominique de Caro, et al.. Metallic Polycrystalline Thin Films of the Single-Component Neutral Molecular Solid Ni(tmdt)2. Journal of the American Chemical Society, 2006, 128 (17), pp.5612-5613. ⟨10.1021/ja060690s⟩. ⟨hal-00182196⟩