Enhancement-mode Al0.66InO.34As/Ga0.67In0.33As metamorphic HEMT : modeling and measurement - Archive ouverte HAL Accéder directement au contenu
Article Dans Une Revue IEEE Transactions on Electron Devices Année : 2001

Enhancement-mode Al0.66InO.34As/Ga0.67In0.33As metamorphic HEMT : modeling and measurement

Résumé

This paper exhibits experimental and theoretical results on metamorphic high-electron mobility transistor (MM-HEMT). Modeling and measurements provide a better knowledge of device physics which allows us to optimize device structures. We present 10-GHz power performances, pulse and gate measurements, and two-dimensional (2-D) hydrodynamic modeling of enhancement-mode (E-mode) Al/sub 0.66/In/sub 0.34/As/Ga/sub 0.67/In/sub 0.33/As NM-HEMT devices. It is the first time that cap layer thickness has been studied for a MM-HEMT. A typical reverse breakdown voltage of 16 V has been obtained. Gate current issued from impact ionization has been shown, for the first time, in such a device. The 2-D hydrodynamic model is a useful tool for cost engineering because it brings more information in terms of physical quantity distributions, necessary to predict breakdown behavior of FET. The 10-GHz measurements with a load-pull power set-up demonstrate the capabilities for a thick cap device with large gate-to-drain extension since an output power of 140 mW/mm have been obtained which is the state-of-the-art for such a device. These results obtained confirm the great interest of the structures for power application systems. The only work reported, to our knowledge, using a MM-HEMT structure in E-mode with an indium content close to 50% has been studied by Eisenbeiser et al.. Their typical gate-to-drain breakdown voltage was 5.2 V. The 0.6 /spl mu/m /spl times/3 mm devices exhibited 30 mW/mm at 850 MHz.
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hal-00152595 , version 1 (07-06-2007)

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Mustafa Boudrissa, Elisabet Delos, Christophe Gaquière, Michel Rousseau, Yvon Cordier, et al.. Enhancement-mode Al0.66InO.34As/Ga0.67In0.33As metamorphic HEMT : modeling and measurement. IEEE Transactions on Electron Devices, 2001, 48 (6), pp.1037-1044. ⟨10.1109/16.925223⟩. ⟨hal-00152595⟩
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