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FinFET achievement : optimum e-beam lithography to etch dense silicon fins networks

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https://hal.archives-ouvertes.fr/hal-00140996
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Submitted on : Wednesday, April 11, 2007 - 10:44:49 AM
Last modification on : Tuesday, October 19, 2021 - 6:37:49 PM

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  • HAL Id : hal-00140996, version 1

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F. Fruleux, J. Penaud, E. Dubois, G. Larrieu. FinFET achievement : optimum e-beam lithography to etch dense silicon fins networks. MIGAS International Summer School on Advanced Microelectronics, MIGAS'04, 2004, Autrans, France. ⟨hal-00140996⟩

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