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Article Dans Une Revue Applied Physics Letters Année : 2007

High performance hard magnetic NdFeB thick films for integration into Micro-Electro-Mechanical-Systems

Résumé

5µm thick NdFeB films have been sputtered onto 100 mm Si substrates using high rate sputtering (18 µm/h). Films were deposited at ≤ 500°C and then annealed at 750°C for 10 minutes. While films deposited at temperatures up to 450°C have equiaxed grains, the size of which decreases with increasing deposition temperature, the films deposited at 500°C have columnar grains. The out-of-plane remanent magnetization increases with deposition temperature, reaching a maximum value of 1.4 T, while the coercivity remains constant at about 1.6 T. The maximum energy product achieved (400 kJ/m3) is comparable to that of high-quality NdFeB sintered magnets.
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Dates et versions

hal-00139182 , version 1 (29-03-2007)

Identifiants

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Nora Dempsey, Arnaud Walther, Frederic May, Dominique Givord, Kirill Khlopkov, et al.. High performance hard magnetic NdFeB thick films for integration into Micro-Electro-Mechanical-Systems. Applied Physics Letters, 2007, 90, pp.092509. ⟨10.1063/1.2710771⟩. ⟨hal-00139182⟩

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