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Physical properties of RF sputtered ITO thin films and annealing effect

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https://hal.archives-ouvertes.fr/hal-00138711
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Submitted on : Tuesday, March 27, 2007 - 11:07:12 AM
Last modification on : Friday, December 3, 2021 - 4:04:04 PM

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  • HAL Id : hal-00138711, version 1

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L. Kerkache, A. Layadi, El Hadj Dogheche, Denis Remiens. Physical properties of RF sputtered ITO thin films and annealing effect. Journal of Physics D: Applied Physics, IOP Publishing, 2006, 39, pp.184-189. ⟨hal-00138711⟩

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