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An optimal high contrast e-beam lithography process for the patterning of dense fin networks

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https://hal.archives-ouvertes.fr/hal-00138653
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Submitted on : Tuesday, March 27, 2007 - 10:22:57 AM
Last modification on : Saturday, October 9, 2021 - 3:11:16 AM

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  • HAL Id : hal-00138653, version 1

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F. Fruleux, J. Penaud, E. Dubois, M. Francois, M. Muller. An optimal high contrast e-beam lithography process for the patterning of dense fin networks. Materials Science and Engineering: C, Elsevier, 2006, 26, pp.893-897. ⟨hal-00138653⟩

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