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Optimisation of HSQ e-beam lithography for the patterning of FinFET transistors

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https://hal.archives-ouvertes.fr/hal-00138652
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Submitted on : Tuesday, March 27, 2007 - 10:22:57 AM
Last modification on : Tuesday, October 19, 2021 - 6:37:48 PM

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  • HAL Id : hal-00138652, version 1

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F. Fruleux, J. Penaud, E. Dubois, M. Francois, M. Muller. Optimisation of HSQ e-beam lithography for the patterning of FinFET transistors. Microelectronic Engineering, Elsevier, 2006, 83, pp.776-779. ⟨hal-00138652⟩

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