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Conference papers

Interfacial layer in the high-k dielectrics : characterization and suppression

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https://hal.archives-ouvertes.fr/hal-00138406
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Submitted on : Monday, March 26, 2007 - 11:18:45 AM
Last modification on : Saturday, October 9, 2021 - 3:19:04 AM

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  • HAL Id : hal-00138406, version 1

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G. Larrieu, M. Tao, N. Moumen, E. Moldonado, W.P. Kirk, et al.. Interfacial layer in the high-k dielectrics : characterization and suppression. 2005, pp.abstract 543. ⟨hal-00138406⟩

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