Skip to Main content Skip to Navigation
Conference papers

An optimal high contrast e-beam lithography process for the patterning of dense fin networks

Document type :
Conference papers
Complete list of metadata

https://hal.archives-ouvertes.fr/hal-00138401
Contributor : Collection Iemn Connect in order to contact the contributor
Submitted on : Monday, March 26, 2007 - 11:04:55 AM
Last modification on : Saturday, October 9, 2021 - 3:11:14 AM

Identifiers

  • HAL Id : hal-00138401, version 1

Citation

F. Fruleux, J. Penaud, E. Dubois, M. Francois, M. Muller. An optimal high contrast e-beam lithography process for the patterning of dense fin networks. 2005, pp.A/PII.01. ⟨hal-00138401⟩

Share

Metrics

Record views

56