Laser-induced defects in fused silica by femtosecond IR irradiation

Arnaud Zoubir (1) , Clara Rivero (2) , Rachel Grodsky (2) , Kathleen Richardson (3) , Martin Richardson (2) , Thierry Cardinal (4) , Michel Couzi (5)

1 Raman Division
2 CREOL - The College of Optics and Photonics [Orlando]
3 School of Material Science and Engineering
4 ICMCB - Institut de Chimie de la Matière Condensée de Bordeaux
5 LPCM - Laboratoire de Physico-Chimie Moléculaire

Photostructural defects resulting from exposure to intense near-infrared femtosecond radiation is studied in three a-SiO2 glasses with different impurity levels. The photoinduced defects are studied by UV absorption spectroscopy and are correlated to the structural modifications in the glass matrix through Raman spectroscopy. Information in the dynamics of the defect generation is revealed by the small photon energy of IR femtosecond laser radiation.

Mots clés: Interactions of particles and radiation with matter; Optical materials

Domaines: Matériaux

Arnaud Zoubir, Clara Rivero, Rachel Grodsky, Kathleen Richardson, Martin Richardson, et al.. Laser-induced defects in fused silica by femtosecond IR irradiation. Physical Review B: Condensed Matter and Materials Physics (1998-2015), 2006, 73 (22), 224117 (5 p.). ⟨10.1103/PhysRevB.73.224117⟩. ⟨hal-00111127⟩