Self-asembly and crystallization behavior of mesoporous, crystalline HfO2 thin films : a model system for the generation of mesostructured transition-metal oxides

Torsten Brezesinski (1) , Bernd Smarsly (1) , Ken-Ichi Iimura (2) , David Grosso (3) , Cédric Boissière (3) , Heinz Amenitsch (4) , Markus Antonietti (1) , Clément Sanchez (3)

1 Max Planck Institute of Colloids and Interfaces
2 Utsunomiya University, Dpt. of Applied Chemistry, Faculty of Engineering
3 LCMCP (site Paris VI) - Laboratoire de Chimie de la Matière Condensée de Paris (site Paris VI)
4 Institute of Biophysics and X-ray structure research Austrian Academy of Sciences

Domaines: Matériaux

Torsten Brezesinski, Bernd Smarsly, Ken-Ichi Iimura, David Grosso, Cédric Boissière, et al.. Self-asembly and crystallization behavior of mesoporous, crystalline HfO2 thin films : a model system for the generation of mesostructured transition-metal oxides. Small journal, 2005, 8-9, pp.889-898. ⟨hal-00071261⟩