| Science Engineering Materials and Process |  |
| Science Engineering Materials and Process | |
| HAL: hal-00692280, version 1 |
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| International Workshop on Wide Band Gap Semiconductor Nanostructures, Chennai : Inde (2011) |
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| Vapor phase processes: From HTCVD processes for high rate epitaxial growth to ALD processes for conformal ultra thin film fabrication. |
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| E. Blanquet (invitée)A. Claudel 1 |
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| (2011-01-10) |
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| 1: | Advanced CERamics Deposition (ACERDE) |
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Institut Polytechnique de Grenoble - Grenoble Institute of Technology – ACERDE |
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| 2: | Science et Ingénierie des Matériaux et Procédés (SIMAP) |
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CNRS : UMR5266 – Université Joseph Fourier - Grenoble I – Institut National Polytechnique de Grenoble (INPG) |
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| 3: | Laboratoire des matériaux et du génie physique (LMGP) |
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CNRS : UMR5628 – Institut polytechnique de Grenoble (Grenoble INP) |
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| Subject | : | Chemical Sciences/Material chemistry |
| hal-00692280, version 1 | |
| http://hal.archives-ouvertes.fr/hal-00692280 | |
| oai:hal.archives-ouvertes.fr:hal-00692280 | |
| From: Michel Pons | |
| Submitted on: Sunday, 29 April 2012 18:12:42 | |
| Updated on: Sunday, 29 April 2012 18:12:42 | |
