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| HAL : jpa-00225921, version 1 |
| DOI : 10.1051/jphyscol:1986728 |
| Fiche détaillée |  Récupérer au format |
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| Journal de Physique Colloques 47, C7 (1986) C7-157-C7-160 |
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| THE INVESTIGATION OF FIELD ADSORPTION AND DIFFUSION OF HELIUM ON THE SURFACE OF TUNGSTEN BY AP-FIM |
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| Ren Gang |
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| (1986) |
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| This work was carried out with studies on the adsorption and diffusion of helium on the surface of tungsten by AP-FIM measurements and showed that helium is only adsorbed on the surface the W (001) and W (111) surface and that the binding energy of the field adsorption between helium and tungsten is 0.16 eV. The depth profile along the W [001] shows the depth of helium to be 40-50 atomic layers and the diffusion activation energy as 0.22 eV. |
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| Domaine | : | Physique/Articles anciens |
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| jpa-00225921, version 1 | |
| http://hal.archives-ouvertes.fr/jpa-00225921 | |
| oai:hal.archives-ouvertes.fr:jpa-00225921 | |
| Contributeur : Archives Journal de Physique | |
| Soumis le : Mercredi 1 Janvier 1986, 08:00:00 | |
| Dernière modification le : Mercredi 1 Janvier 1986, 08:00:00 | |
