%0 Journal Article
%T In Recognition of Professor Hitchman: Advances in Chemical Vapor Deposition.
%+ Centre interuniversitaire de recherche et d'ingenierie des matériaux (CIRIMAT)
%A Maury, Francis
%A Alexandrov, Sergey
%A Barreca, Davide
%A Davazoglou, Dimitris
%A Pemble, Martyn
%< avec comité de lecture
%@ 2196-7350
%J Advanced Materials Interfaces
%I Wiley
%V 4
%N 18
%P 1700984
%8 2017-09-22
%D 2017
%R 10.1002/admi.201700984
%K Chemical vapor deposition (CVD)
%K Chemical vapor deposition (CVD)
%Z Engineering Sciences [physics]/OtherJournal articles
%X Chemical vapor deposition (CVD) processes had been around for nearly 100 years before they began to attract interest from materials scientists and electronics engineers in the 60s and 70s, as a result of the rapidly growing microelectronics industry. The successful development of this complicated technology required a deep physicochemical understanding of deposition processes and reaction mechanisms. This resulted in a large number of scientists from different disciplines studying the basics of CVD.
%G English
%2 https://hal.science/hal-03512025/document
%2 https://hal.science/hal-03512025/file/Maury_24493.pdf
%L hal-03512025
%U https://hal.science/hal-03512025
%~ UNIV-TLSE3
%~ CNRS
%~ INC-CNRS
%~ TOULOUSE-INP
%~ UNIV-UT3
%~ UT3-INP
%~ UT3-TOULOUSEINP
%~ TEST2-HALCNRS
%~ CIRIMAT