Thermal stability of Co/C multilayers

Jingtao Zhu (1) , Yuchun Tu (2) , Yanyan Yuan (2) , Zhixiang Feng (1) , Haochuan Li (1) , Yizhi Zhang (1) , Philippe Jonnard (2) , Christian Mény (3) , Karine Le Guen (2) , Jean-Michel André (2) , Zhanshan Wang (1)

1 MOE Key Laboratory of Advanced Micro-structured Materials
2 LCPMR - Laboratoire de Chimie Physique - Matière et Rayonnement
3 IPCMS - Institut de Physique et Chimie des Matériaux de Strasbourg

The structural and interface changes induced by thermal annealing in Co/C multilayers were investigated. Co/C multilayers with period thickness of 4.1 nm and bi-layer number of 20 were deposited by direct current magnetron sputtering. We characterized all samples by using x-ray reflectivity, x-ray diffuse scattering, zero-field nuclear magnetic resonance spectroscopy and x-ray dif-fraction. The results indicate that Co and C atoms mixed during deposition and then after annealing both atoms separated from their mixed region. The annealing process also causes a sharp increase of roughness at interfaces, which can be attributed to the crystallization of Co layers.

Mots clés: multilayers; interface; thermal effects; x-rays

Domaines: Autre [cond-mat.other]

Jingtao Zhu, Yuchun Tu, Yanyan Yuan, Zhixiang Feng, Haochuan Li, et al.. Thermal stability of Co/C multilayers . Materials Research Express, 2014, 1, pp.046503. ⟨10.1088/2053-1591/1/4/046503⟩. ⟨hal-01238002⟩