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Article Dans Une Revue Measurement Science and Technology Année : 2014

Characterization of SEM speckle pattern marking and imaging distortion by Digital Image Correlation

Adrien Guery
Félix Latourte
  • Fonction : Auteur
François Hild

Résumé

Surface patterning by e-beam lithography and SEM imaging distortions are studied via digital image correlation. The global distortions from the reference pattern, which has been numerically generated, are first quantified from a digital image correlation procedure between the (virtual) reference pattern and the actual SEM image both in secondary and backscattered electron imaging modes. These distortions result from both patterning and imaging techniques. These two contributions can be separated (without resorting to an external caliper) based on images of the same patterned surface acquired at different orientations. Patterning distortions are much smaller than those due to imaging on wide field images.
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Dates et versions

hal-00947399 , version 1 (18-02-2014)

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Adrien Guery, Félix Latourte, François Hild, Stéphane Roux. Characterization of SEM speckle pattern marking and imaging distortion by Digital Image Correlation. Measurement Science and Technology, 2014, 25 (1), pp.015401. ⟨10.1088/0957-0233/25/1/015401⟩. ⟨hal-00947399⟩
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