W-Cr-C-N Nanocomposite Thin-Film Coatings via Reactive Magnetron Sputtering

Michael Walock (1) , Yujiao Zou (1) , Denis Lagadrillere (2) , Corinne Nouveau (2) , Andrei V Stanishevsky (1)

1 Department of Physics [Birmingham]
2 LABOMAP - Laboratoire Bourguignon des Matériaux et Procédés

While binary tungsten carbide can form smooth, hard films, these suffer from low fracture toughness. Tungsten nitride films are frequently harder, but are more brittle. Chromium nitride has excellent wear and oxidation resistance, but films often form with low hardness. Composites of these binary compounds offer a possibility to tailor the material for a desired combination of properties. To this end, we have used reactive RF-magnetron sputtering with Cr and WC targets to form quaternary composites, with nitrogen as the reactive gas. The coatings were deposited on Si, Ti, and steel substrates. The nitrogen partial pressure was varied to investigate the relationship between the film properties and the deposition conditions. Energy dispersive spectroscopy showed changes in the chemical composition as a result of the change in nitrogen partial pressure. X-ray diffraction illuminated the structure as either a solid solution with a B1 NaCl structure, or a nanocomposite with the average crystallite size under 11 nm. Optical interferometer revealed low compressive stresses. And nanoindentation established that the films are hard and adherent.

Mots clés: RF magnetron sputtering; CrWCN; physico-chemical and mechanical properties

Domaines: Science des matériaux [cond-mat.mtrl-sci]; Matériaux

Michael Walock, Yujiao Zou, Denis Lagadrillere, Corinne Nouveau, Andrei V Stanishevsky. W-Cr-C-N Nanocomposite Thin-Film Coatings via Reactive Magnetron Sputtering. 54th Society of Vacuum Coaters Annual Technical Conference, Apr 2011, United States. 9p. ⟨hal-00911031⟩