Investigation of vanadium and nitride alloys thin layers deposited by PVD

A. Brayek (1) , B. Tlilli (2) , T. Ghrib (1) , Corinne Nouveau (3)

1 Laboratoire de Photovoltaïque
2 Mécanique Appliquée, Ingénierie et Industrialisation
3 LABOMAP - Laboratoire Bourguignon des Matériaux et Procédés

In this work we present the technique of magnetron vapor deposition and the effect of several deposition parameters on the structural and morphological properties of prepared thin films. It was noted that the deposition time has an effect on the crystallinity, mechanical properties such as residual stress, roughness surface and the layer composition from target products. Studies were carried out on layers of vanadium (V) and the nitride vanadium (VN).

Mots clés: PVD; VN; electrical resistivity; roughness; residual stress

Domaines: Science des matériaux [cond-mat.mtrl-sci]

A. Brayek, B. Tlilli, T. Ghrib, Corinne Nouveau. Investigation of vanadium and nitride alloys thin layers deposited by PVD. EMM-FM2011 - First Euro Mediterranean Meeting on Functionalized Materials, Oct 2011, Tunisia. 11p, ⟨10.1051/epjconf/20122900042⟩. ⟨hal-00908940⟩