Interdependence of structural and electrical properties in tantalum/tantalum oxide multilayers

Arnaud Cacucci (1) , Stéphane Loffredo (1) , Valérie Potin (1) , Luc Imhoff (1) , Nicolas Martin (2)

1 ICB - Laboratoire Interdisciplinaire Carnot de Bourgogne
2 FEMTO-ST - Franche-Comté Électronique Mécanique, Thermique et Optique - Sciences et Technologies (UMR 6174)

Dc reactive sputtering was used to deposit tantalum metal/oxide periodic nanometric multilayers using the innovative technique namely, the reactive gas pulsing process (RGPP). Different pulsing periods were used for each deposition to produce metal-oxide periodic alternations included between 5 and 80 nm. Structure, crystallinity and chemical composition of these films were systematically investigated by Transmission Electron Microscopy (TEM) and Energy-dispersive X-ray (EDX) spectroscopy techniques. Moreover, electrical properties were also studied by the Van der Pauw technique.

Domaines: Micro et nanotechnologies/Microélectronique

Arnaud Cacucci, Stéphane Loffredo, Valérie Potin, Luc Imhoff, Nicolas Martin. Interdependence of structural and electrical properties in tantalum/tantalum oxide multilayers. Surface and Coatings Technology, 2013, 227, pp.38 - 41. ⟨10.1016/j.surfcoat.2012.10.064⟩. ⟨hal-00875700⟩