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Article Dans Une Revue Advanced Materials Année : 2013

Universal electric-field-driven resistive transition in narrow-gap Mott insulators

Résumé

One of today's most exciting research frontier and challenge in condensed matter physics is known as Mottronics, whose goal is to incorporate strong correlation effects into the realm of electronics. In fact, taming the Mott insulator-to-metal transition (IMT), which is driven by strong electronic correlation effects, holds the promise of a commutation speed set by a quantum transition, and with negligible power dissipation. In this context, one possible route to control the Mott transition is to electrostatically dope the systems using strong dielectrics, in FET-like devices. Another possibility is through resistive switching, that is, to induce the insulator-to-metal transition by strong electric pulsing. This action brings the correlated system far from equilibrium, rendering the exact treatment of the problem a difficult challenge. Here, we show that existing theoretical predictions of the off-equilibrium manybody problem err by orders of magnitudes, when compared to experiments that we performed on three prototypical narrow gap Mott systems V2-xCrxO3, NiS2-xSex and GaTa4Se8, and which also demonstrate a striking universality of this Mott resistive transition (MRT). We then introduce and numerically study a model based on key theoretically known physical features of the Mott phenomenon in the Hubbard model. We find that our model predictions are in very good agreement with the observed universal MRT and with a non-trivial timedelay electric pulsing experiment, which we also report. Our study demonstrates that the MRT can be associated to a dynamically directed avalanche.
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Dates et versions

hal-00863729 , version 1 (20-09-2013)

Identifiants

Citer

Pablo Stoliar, Laurent Cario, Etienne Janod, Benoît Corraze, Catherine Guillot-Deudon, et al.. Universal electric-field-driven resistive transition in narrow-gap Mott insulators. Advanced Materials, 2013, 25 (23), pp.3222-3226. ⟨10.1002/adma.201301113⟩. ⟨hal-00863729⟩
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