Field electron emission of double walled carbon nanotube film prepared by drop casting method

Prakash R. Somani (1) , Savita P. Somani (1) , Shu Ping Lau (2) , Emmanuel Flahaut (3) , Masaki Tanemura (4) , Masayoshi Umeno (1)

1 Department of Electronics and Information Engineering (Kasugai, Japan)
2 Nanyang Technological University [Singapour]
3 CIRIMAT - Centre interuniversitaire de recherche et d'ingenierie des matériaux
4 NIT - Nagoya Institute of Technology

Thick films of double walled carbon nanotubes (DWCN) were deposited on indium-tin-oxide (ITO) coated glass substrates by drop casting method and were studied for their field electron emission property in a parallel plate configuration using bare ITO coated glass as counter electrode. They show excellent field electron emission property with low turn-on-field of about 0.8 V/lm and threshold field of about 1.8 V/lm. Field enhancement factor calculated from the non-saturated region of the FN plot is about 1715. Field electron emission current was observed to be stable up to 3000 min, indicating thereby that DWCNs are excellent electron emitters with appreciable stable performance.

Mots clés: Double walled carbon nanotubes; Field electron emission; Double walled carbon nanotubes

Domaines: Matériaux

Prakash R. Somani, Savita P. Somani, Shu Ping Lau, Emmanuel Flahaut, Masaki Tanemura, et al.. Field electron emission of double walled carbon nanotube film prepared by drop casting method. Solid-State Electronics, 2007, vol. 51, pp. 788-792. ⟨10.1016/j.sse.2007.02.041⟩. ⟨hal-00808916⟩