I.D.A New Model for the Design of Tight Interference Fit Taking Into Account the Surface Texture M.M.E'2000 - Archive ouverte HAL Accéder directement au contenu
Communication Dans Un Congrès Année : 2000

I.D.A New Model for the Design of Tight Interference Fit Taking Into Account the Surface Texture M.M.E'2000

Résumé

The tight interference fit is very largely applied in industry, but, in all proposed models of calculation, one supposes that the contact interfaces are always perfect which leads us to establish some limits which are not only contrary to the grip principle but also greatly increase production costs. This paper presents a new model that takes into account the macro and micro-geometrical defects for calculating the contact pressure. We show that it is possible to reduce the cost and assure the fit resistance. The form defect can be integrated in FEM codes and the surface texture can be represented by a loss of interference due to the plastic strains of the asperities. The presented method, valid for a simple geometry, can be introduced in FEM code for solving industrial cases
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Dates et versions

hal-00803926 , version 1 (23-03-2013)

Identifiants

  • HAL Id : hal-00803926 , version 1

Citer

Jean François Fontaine, Gong-Ming Yang, Jean Claude Coquille, M. Lambertin. I.D.A New Model for the Design of Tight Interference Fit Taking Into Account the Surface Texture M.M.E'2000. I.D.M.M.E'2000, May 2000, Montréal, Canada. ⟨hal-00803926⟩
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