 |
|
|
|
| HAL : hal-00670058, version 1 |
| Fiche détaillée |  Récupérer au format |
|
|
| International Symposium on the Physical and Failure Analysis of Integrated Circuits, IPFA, Singapour : Singapour (2009) |
|
|
|
|
| Best test pattern failure analysis flow for functional logic failure localization by IR-OBIRCH technique |
|
|
| A. Machouat 1G. Haller 1 |
|
|
| (04/09/2009) |
|
|
|
| The optical IR-OBIRCh technique is a standard failure analysis tool used to localize defects that are located at interconnects layers levels. For a functional logic failure, a failing test pattern is used to condition the device into a particular logic state to generate the failure. Commonly, the defect is detected for a set of test patterns. All test patterns will not provide the same IR-OBIRCh response. A random selection of test patterns may not lead to localize the defect by IR-OBIRCh technique or give fake results. We have performed an extended study of IR-OBIRCh response of a functional logic failure in function of test patterns. Based on these results a best test pattern failure analysis flow has been developed and implemented in order to localize a functional logic failure with IR-OBIRCh technique. |
|
|
|
|
|
|
|
|
|
|
|
| 1 : | St Microelectronics |
|
|
|
ST microelectronics |
|
|
| 2 : | Laboratoire de l'intégration, du matériau au système (IMS) |
|
|
|
CNRS : UMR5218 – Université Sciences et Technologies - Bordeaux I – Institut Polytechnique de Bordeaux |
|
|
| 3 : | Centre National d'Etudes Spatiales (CNES) |
|
|
|
CNES |
|
|
|
|
|
|
|
|
|
| Domaine | : | Sciences de l'ingénieur/Electronique Physique/Physique/Optique |
| hal-00670058, version 1 | |
| http://hal.archives-ouvertes.fr/hal-00670058 | |
| oai:hal.archives-ouvertes.fr:hal-00670058 | |
| Contributeur : Frédéric Darracq | |
| Soumis le : Mardi 14 Février 2012, 14:25:23 | |
| Dernière modification le : Mardi 14 Février 2012, 14:25:23 | |
