Molecular dynamics simulations of nanometric metallic multilayers: Reactivity of the Ni-Al system - Archive ouverte HAL Accéder directement au contenu
Article Dans Une Revue Physical Review B: Condensed Matter and Materials Physics (1998-2015) Année : 2011

Molecular dynamics simulations of nanometric metallic multilayers: Reactivity of the Ni-Al system

Résumé

The reactivity of a layered Ni-Al-Ni system is studied by means of molecular dynamics simulations, using an embedded-atom method type potential. The system, made of an fcc-Al layer embedded in fcc-Ni, is initially thermalized at the fixed temperature of 600 K. The early interdiffusion of Ni and Al at interfaces is followed by the massive diffusion of Ni in the Al layer and by the spontaneous phase formation of B2-NiAl. The solid-state reaction is associated with a rapid system heating, which further enhances the diffusion processes. For longer times, the system may partly lose some its B2-NiAl microstructure in favor of the formation of L12-Ni3Al. This stage is controlled by the diffusion of Al in the Ni-rich phase, and a layer-by-layer development of the new phase is observed.
Fichier principal
Vignette du fichier
PRB_84_024113_2011.pdf (793.98 Ko) Télécharger le fichier
Origine : Fichiers éditeurs autorisés sur une archive ouverte

Dates et versions

hal-00645520 , version 1 (28-11-2011)

Identifiants

Citer

Florence Baras, Olivier Politano. Molecular dynamics simulations of nanometric metallic multilayers: Reactivity of the Ni-Al system. Physical Review B: Condensed Matter and Materials Physics (1998-2015), 2011, 84, pp.024113. ⟨10.1103/PhysRevB.84.024113⟩. ⟨hal-00645520⟩
44 Consultations
307 Téléchargements

Altmetric

Partager

Gmail Facebook X LinkedIn More