Noise properties of Pb/Cd-free thick film resistors

Adam Witold Stadler (1) , Andrzej Kolek (1) , Zbigniew Zawiślak (1) , Krzysztof Mleczko (1) , Małgorzata Jakubowska (2, 3) , Konrad Rafał Kiełbasiński (2, 4) , Anna Młożniak (2)

1 Department of Electronics Fundamentals
2 Institute of Electronic Materials Technology
3 Faculty of Mechatronics
4 Institute of Microelectronics and Optoelectronics

Low-frequency noise spectroscopy has been used to examine noise properties of Pb/Cd-free RuO 2- and CaRuO 3 -based thick films screen printed on alumina substrates. Experiments were performed in temperature range 77- 300 K and frequency range 0.5 - 5000 Hz with multiterminal devices. The measured noise has been recognized as resistance noise that consists of background 1/f noise and components generated by several thermally activated noise sources of different activation energies. The total noise has been composed of the contributions generated in resistive layer and in resistive/conductive layers interface. These noise sources are non-uniformly distributed in the resistor volume. Noise intensity of new resistive layers has been described by noise parameter, C bulk. Pb/Cd-free layers occurred to be noisier than their Pb-containing counterparts, however the remove of Pb and Cd from resistive composition is hardly responsible for the increase of the noise. In case of RuO 2 layers noise increases most likely due to larger grain size of RuO 2 powder used to prepare resistive pastes. The information about the quality of resistive-to-conductive layers interface occurred to be stored in the values of noise parameter C int. Pb/Cd-free RuO 2 -based resistive pastes form well-behaved interfaces with various Ag-based conductive pastes. On the contrary, CaRuO 3 -based paste forms bad contacts with AgPd terminations because density of TANSs increases in the interface area.

Mots clés: Physical Sciences

Adam Witold Stadler, Andrzej Kolek, Zbigniew Zawiślak, Krzysztof Mleczko, Małgorzata Jakubowska, et al.. Noise properties of Pb/Cd-free thick film resistors. Journal of Physics D: Applied Physics, 2010, 43 (26), pp.265401. ⟨10.1088/0022-3727/43/26/265401⟩. ⟨hal-00629953⟩