Reduction-induced Fermi level pinning at the interfaces between Pb(Zr,Ti)O3 and Pt, Cu and Ag metal electrodes - Archive ouverte HAL Accéder directement au contenu
Article Dans Une Revue Journal of Physics D: Applied Physics Année : 2011

Reduction-induced Fermi level pinning at the interfaces between Pb(Zr,Ti)O3 and Pt, Cu and Ag metal electrodes

Résumé

The interface formation between Pb(Zr, Ti)O 3 and Pt, Cu and Ag was studied using in situ photoelectron spectroscopy. A strong interface reaction and a reduction of the substrate surface is observed for all three interfaces as evidenced by the appearance of metallic Pb species. Despite the different work function of the metals, nearly identical barrier heights are found with E F − E VB = 1.6 ± 0.1 eV, 1.8 ± 0.1 eV and 1.7 ± 0.1 eV of the as-prepared interfaces with Pt, Cu and Ag, respectively. The barrier heights are characterized by a strong Fermi level pinning, which is attributed to an oxygen deficient interface induced by the chemical reduction of Pb(Zr, Ti)O 3 during metal deposition.
Fichier principal
Vignette du fichier
PEER_stage2_10.1088%2F0022-3727%2F44%2F25%2F255301.pdf (344.28 Ko) Télécharger le fichier
Origine : Fichiers produits par l'(les) auteur(s)
Loading...

Dates et versions

hal-00627539 , version 1 (29-09-2011)

Identifiants

Citer

Feng Chen, Robert Schafranek, Wenbin Wu, Andreas Klein. Reduction-induced Fermi level pinning at the interfaces between Pb(Zr,Ti)O3 and Pt, Cu and Ag metal electrodes. Journal of Physics D: Applied Physics, 2011, 44 (25), pp.255301. ⟨10.1088/0022-3727/44/25/255301⟩. ⟨hal-00627539⟩

Collections

PEER
79 Consultations
387 Téléchargements

Altmetric

Partager

Gmail Facebook X LinkedIn More