Simulation of chemical vapor infiltration and deposition based on 3D images: a local scale approach

William Ros (1) , Gérard L. Vignoles (1) , Christian Germain (2) , Philippe Supiot (3) , Georges Kokkoris (4)

1 LCTS - Laboratoire des Composites Thermostructuraux
2 IMS - Laboratoire de l'intégration, du matériau au système
3 IEMN - Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520
4 Institute of Microelectronics

A numerical solution for the simulation of chemical vapor infiltration of ceramic matrix composites is presented. This computational model requires a 3D representation of the preform. Gas transport and chemical reaction are simulated by a Monte Carlo random walk technique. The developed algorithm can also be used for determination of effective transport and reaction properties in a porous medium. It is firstly validated by considering the simple case of diffusion and reaction in a flat pore. Results of infiltration of an actual fiber arrangement are described and discussed. Extension to deposition on a thin substrate with asperities is also studied.

Mots clés: Chemical vapor infiltration; Trench deposition; Diffusion/reaction problems; Random walks; 3D image-based modeling

Domaines: Matériaux

William Ros, Gérard L. Vignoles, Christian Germain, Philippe Supiot, Georges Kokkoris. Simulation of chemical vapor infiltration and deposition based on 3D images: a local scale approach. Chemical Vapor Deposition, 2011. ⟨hal-00624480⟩