Controlling roughness: from etching to nanotexturing and plasma-directed organization on organic and inorganic materials

Evangelos Gogolides (1) , Angeliki Tserepi (1) , Vassilios Constantoudis (1) , George Kokkoris (1) , Dimitrios Kontziampasis (1) , Katerina Tsougeni (1) , George Boulousis (1) , Marilena Vlachopoulou (1)

1 NCSR "Demokritos", IAMPPNM - Institute of Microelectronics

We describe how plasma-wall interactions in etching plasmas lead to either random roughening / nanotexturing of polymeric and Silicon surfaces, or formation of organized nanostructures on such surfaces. We conduct carefully designed experiments of plasma-wall interactions to understand the causes of both phenomena, and present Monte-Carlo simulation results confirming the experiments. We discuss emerging applications in wetting and optical property control, protein adsorption, microfluidics and lab-on-a-chip fabrication and modification, and cost-effective silicon mold fabrication. We conclude with an outlook on the plasma reactor future designs to take advantage of the observed phenomena for new micro and nanomanufacturing processes.

Mots clés: Physical Sciences

Evangelos Gogolides, Angeliki Tserepi, Vassilios Constantoudis, George Kokkoris, Dimitrios Kontziampasis, et al.. Controlling roughness: from etching to nanotexturing and plasma-directed organization on organic and inorganic materials. Journal of Physics D: Applied Physics, 2011, 44 (17), pp.174021. ⟨10.1088/0022-3727/44/17/174021⟩. ⟨hal-00613279⟩