Random phase mask in a filamentation regime: application to the localization of point sources

Florence de La Barrière (1) , Guillaume Druart (1) , Nicolas Guérineau (1) , Yann Ferrec (1) , Jean Albert Taboury (2) , Jérôme Primot (1)

1 ONERA - The French Aerospace Lab [Châtillon]
2 Laboratoire Charles Fabry / Scop

We present a optical system with an extended point-spread function (PSF) for the localization of point sources in the visible and IR spectral ranges with a subpixel precision. This compact system involves a random phase mask (RPM) as its unique component. It exhibits original properties, because this RPM is used in a particular regime, called the ''filamentation regime,'' before the speckle region. The localization is performed by calculating the phase correlation between the PSF and the image obtained under off-axis illumination. Numerical simulations are presented to assess the basic optical properties of this RPM in the filamentation regime.

Mots clés: Roughness; Statistical optics; Wave propagation

Domaines: Optique [physics.optics]

Florence de La Barrière, Guillaume Druart, Nicolas Guérineau, Yann Ferrec, Jean Albert Taboury, et al.. Random phase mask in a filamentation regime: application to the localization of point sources. Optics Letters, 2012, 36 (5), pp.684--686. ⟨10.1364/OL.36.000684⟩. ⟨hal-00569371⟩