Some aspects of pulsed laser deposition of Si nanocrystalline films

B. Polyakov (1) , A. Petruhins (1) , J. Butikova (1) , A. Kuzmin (1) , I. Tale (1)

1 Institute of Solid State Physics

Nanocrystalline silicon films were deposited by a picosecond laser ablation on different substrates in vacuum at room temperature. A nanocrystalline structure of the films was evidenced by atomic force microscopy (AFM), optical and Raman spectroscopies. A blue shift of the absorption edge was observed in optical absorption spectra, and a decrease of the optical phonon energy at the Brillouin zone centre was detected by Raman scattering. Early stages of nanocrystalline film formation on mica and HOPG substrates were studied by AFM. Mechanism of nanocrystal growth on substrate is discussed.

Mots clés: Physical Sciences

B. Polyakov, A. Petruhins, J. Butikova, A. Kuzmin, I. Tale. Some aspects of pulsed laser deposition of Si nanocrystalline films. European Physical Journal: Applied Physics, 2009, 48 (2), pp.1-5. ⟨10.1051/epjap/2009140⟩. ⟨hal-00518314⟩