%0 Journal Article
%T Radiative heat transfer at nanoscale mediated by surface plasmons for highly doped silicon.
%+ Laboratoire Charles Fabry de l'Institut d'Optique / Naphel
%A Rousseau, Emmanuel
%A Laroche, Marine
%A Greffet, Jean-Jacques
%Z Leti-Carnot Institute
%< avec comité de lecture
%@ 0003-6951
%J Applied Physics Letters
%I American Institute of Physics
%V 95
%P 231913
%8 2009-12-10
%D 2009
%R 10.1063/1.3271681
%Z Physics [physics]/Mechanics [physics]/Thermics [physics.class-ph]
%Z Engineering Sciences [physics]/Mechanics [physics.med-ph]/Thermics [physics.class-ph]
%Z Physics [physics]/Physics [physics]/Optics [physics.optics]
%Z Engineering Sciences [physics]/Micro and nanotechnologies/MicroelectronicsJournal articles
%X In this letter, we revisit the role of surface plasmons for nanoscale radiative heat transfer between doped silicon surfaces. We derive a new accurate and closed-form expression of the radiative near-field heat transfer. We also analyse the flux and find that there is a doping level that maximizes the heat flux.
%G English
%2 https://hal.science/hal-00428587/document
%2 https://hal.science/hal-00428587/file/ms_rousseau.pdf
%L hal-00428587
%U https://hal.science/hal-00428587
%~ IOGS
%~ CNRS
%~ UNIV-PSUD
%~ PARISTECH
%~ LCFIO
%~ UNIV-PARIS-SACLAY
%~ UNIV-PSUD-SACLAY
%~ ANR