Dry film resist for fast fluidic prototyping

Paul Vulto (1) , Nicolas Glade (2) , Luigi Altomare (1) , Jacqueline Bablet (2) , Gianni Medoro (3) , A. Leonardi (1) , Aldo Romani (1) , Isabelle Chartier (2) , Nicolo Manaresi (3) , Marco Tartagni (1) , Roberto Guerrieri (1)

1 ARCES - Advanced Research Center on Electronic Systems for Information and Communication Technologies E. De Castro [Bologna]
2 CEA-LETI - Commissariat à l'énergie atomique et aux énergies alternatives - Laboratoire d'Electronique et de Technologie de l'Information
3 Silicon Biosystems, Bologna

Dry film photoresist is used for creating microfluidic structures by sandwiching the patterned resist in between of two substrates. The technique is applied for creating hybrid biochips for dielectrophoretic cell manipulation. Multiple level lithography is demonstrated and biocompatibility of the resist is proven. Due to simple fabrication procedures the resist can be processed in a low-tech environment.

Mots clés: Dry film resist; microfluidics; prototyping; hybrid chips; packaging

Domaines: Génie des procédés; Micro et nanotechnologies/Microélectronique

Paul Vulto, Nicolas Glade, Luigi Altomare, Jacqueline Bablet, Gianni Medoro, et al.. Dry film resist for fast fluidic prototyping. 8th International Conference on Miniaturized Systems in Chemistry and Life Sciences - Micro Total Analysis Systems (µTAS) 2004, 2004, Malmö, Sweden. pp.43-45. ⟨hal-00346473⟩