High Aspect Pattern Formation by Integration of Micro Inkjetting and Electroless Plating

P.W. Gian (1) , Xuechuan Shan (1) , Y.N. Liang (1) , B.K. Lok (1) , C. W. Lu (1) , B. L. Ooi (2)

1 SIMTech - Singapore Institute of Manufacturing Technology
2 Electrical and Computer Engineering

This paper reports on formation of high aspect micro patterns on low temperature co-fired ceramic (LTCC) substrates by integrating micro inkjetting with electroless plating. Micro inkjetting was realized by using an inkjetting printer that ejects ink droplets from a printhead. This printhead consists of a glass nozzle with a diameter of 50 μm and a piezoelectric transducer that is coated on the nozzle. The silver colloidal solution was inkjetted on a sintered CT800 ceramic substrate, followed by curing at 200 °C for 60 minutes. As a result, the silver trace with a thickness of 200 nm was obtained. The substrate, with the ejected silver thin film as the seed layer, was then immersed into a preinitiator solution to coat a layer of palladium for enhancing the deposition of nickel. Electroless nickel plating was successfully conducted at a rate of 0.39 μm /min, and the thickness of traces was plated up to 84 μm. This study demonstrates that the integration of inkjetting with plating is an effective method to form high aspect patterns at the demand location.

Domaines: Autre [cs.OH]

P.W. Gian, Xuechuan Shan, Y.N. Liang, B.K. Lok, C. W. Lu, et al.. High Aspect Pattern Formation by Integration of Micro Inkjetting and Electroless Plating. DTIP 2008, Apr 2008, Nice, France. pp.162-167. ⟨hal-00277700⟩