Wall shear stress and pressure sensors development for active flow control

Dimitrios Tsamados (1) , David Meunier (1) , Mourad Laghrouche (1) , Jumana Boussey-Said (1) , Sedat F. Tardu (2)

1 IMEP - Institut de Microélectronique, Electromagnétisme et Photonique
2 LEGI - Laboratoire des Écoulements Géophysiques et Industriels [Grenoble]

In this paper we present a technology for wall shear stress and pressure integrated sensor fabrication. Thanks to the use of SOI wafers and wafer bonding technique, we came up with an innovative technology that provides high on-chip density of sensors required for arrays utilized in numerous microfluidic applications like active control of flow. At the end some wall shear stress results are presented.

Mots clés: MEMS; SOI; pressure sensors; wall shear stress sensors

Domaines: Mécanique des fluides [physics.class-ph]; Mécanique des fluides [physics.class-ph]; Micro et nanotechnologies/Microélectronique

Dimitrios Tsamados, David Meunier, Mourad Laghrouche, Jumana Boussey-Said, Sedat F. Tardu. Wall shear stress and pressure sensors development for active flow control. SPIE International Symposium Micromachining and Microfabrication, Jan 2004, San Jose, CA, United States. pp.524533, ⟨10.1117/12.524533⟩. ⟨hal-00262240⟩