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Article Dans Une Revue Applied Physics Letters Année : 2005

Anisotropy of thermal expansion in YAlO3 and NdGaO3

Résumé

YAlO3 and NdGaO3 thermal expansion coefficients were measured using in-situ powder X-ray diffraction in the temperature range 28-650°C. They exhibit a clear anisotropy: the expansion, quite similar along the [100] and [001] directions, is much lower along the [010] direction. The formation of cracks observed in YBa2Cu3O7-d thin films deposited on YAlO3 and NdGaO3 substrates is likely related to the anisotropy. Stress value calculations have been performed in both systems. They indicate the intrinsic components are specifically high in YAlO3.

Domaines

Matériaux
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Dates et versions

hal-00207926 , version 1 (18-01-2008)

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Odette Chaix-Pluchery, Bernard Chenevier, J. J. Robles. Anisotropy of thermal expansion in YAlO3 and NdGaO3. Applied Physics Letters, 2005, 86, pp.251911. ⟨10.1063/1.1944901⟩. ⟨hal-00207926⟩

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