Raman spectroscopy and X-ray diffraction studies of stress effects in PbTiO3 thin films

A. Bartasyte (1, 2) , O. Chaix-Pluchery (1) , J. Kreisel (1) , J. Santiso (3) , S. Margueron (1) , Michel Boudard (4) , Carmen Jiménez (1) , A. Abrutis (2) , F. Weiss (1)

1 LMGP - Laboratoire des matériaux et du génie physique
2 Department of General and Inorganic Chemistry
3 CIN2 - Research Center for Nanoscience ans Nanotechnology
4 SIMaP - Science et Ingénierie des Matériaux et Procédés

A systematic study of domain structure and residual stress evolution with film thickness and of phase transition in c/a epitaxial PbTiO3/LaAlO3 films using X-ray diffraction and Raman spectroscopy is reported. Both techniques revealed that the films are under tensile residual stress in the film plane and that a-domains are more stressed than c-domains. The two components of the large A1(TO) Raman modes are associated with a- and c-domains and their intensity ratio correlates to the volume fraction of a-domains. The evolution of the Raman signature with temperature revealed that the spectrum of a-domains disappears around 480°C whereas c-domains present an anomaly in their spectrum at 500°C but maintain a well-defined Raman signature up to 600°C.

Mots clés: PbTiO3 films on LaAlO3; X-ray diffraction; Raman spectroscopy; domain structure; phase transition; residual stress

Domaines: Matériaux; Génie des procédés

A. Bartasyte, O. Chaix-Pluchery, J. Kreisel, J. Santiso, S. Margueron, et al.. Raman spectroscopy and X-ray diffraction studies of stress effects in PbTiO3 thin films. IEEE Transactions on Ultrasonics, Ferroelectrics and Frequency Control, 2007, 54 (12), pp.2623. ⟨10.1109/TUFFC.2007.589⟩. ⟨hal-00204222⟩