Continuous writing technique of long gratings for metrological applications
Résumé
The method presented here is an optical technique allowing the high productivity printing of long submicron period gratings by means of a phase mask illuminated by an intensity modulated laser beam. The continuous writing of the grating permits to avoid stitching errors and the fabrication of very long gratings. The main applications concern the fabrication of long optical scales for high resolution optical encoders. The experimental results presented here show 100 mm long resist gratings with 500 nm period.