Continuous writing technique of long gratings for metrological applications - Archive ouverte HAL Accéder directement au contenu
Communication Dans Un Congrès Année : 2006

Continuous writing technique of long gratings for metrological applications

Résumé

The method presented here is an optical technique allowing the high productivity printing of long submicron period gratings by means of a phase mask illuminated by an intensity modulated laser beam. The continuous writing of the grating permits to avoid stitching errors and the fabrication of very long gratings. The main applications concern the fabrication of long optical scales for high resolution optical encoders. The experimental results presented here show 100 mm long resist gratings with 500 nm period.
Fichier non déposé

Dates et versions

hal-00142970 , version 1 (23-04-2007)

Identifiants

Citer

Emilie Gamet, Yves Jourlin, Stéphanie Reynaud, Jean-Claude Pommier, Olivier Parriaux. Continuous writing technique of long gratings for metrological applications. Apr 2006, pp.618808, ⟨10.1117/12.662207⟩. ⟨hal-00142970⟩
28 Consultations
0 Téléchargements

Altmetric

Partager

Gmail Facebook X LinkedIn More