UTA versus line emission for EUVL: Studies on xenon emission at the NIST EBIT

K. Fahy (1) , P. Dunne (1) , L. Mckinney (1) , G. O'Sullivan (1) , E. Sokell (1) , J. White (1) , A. Aguilar (2) , J. M. Pomeroy (2) , J. N. Tan (2) , B. Blagojevic (2) , E.-O. Lebigot (2, 3) , J. D. Gillaspy (2)

1 Department of Experimental Physics
2 Atomic Physics Division
3 LKB (Jussieu) - Laboratoire Kastler Brossel

Spectra from xenon ions have been recorded at the NIST EBIT and the emission into a 2% bandwidth at 13.5 nm arising from 4d-5p transitions compared with that from 4d-4f and 4p-4d transitions in Xe XI and also with that obtained from the unresolved transition array (UTA) observed to peak just below 11 nm. It was found that an improvement of a factor of five could be gained in photon yield using the UTA rather than the 4d-5p emission. The results are compared with atomic structure calculations and imply that a significant gain in efficiency should be obtained using tin, in which the emission at 13.5 nm comes from a similar UTA, rather than xenon as an EUVL source material.

Mots clés: xenon; spectrum; EBIT; UTA; ions; EUV; light source

Domaines: Physique Atomique [physics.atom-ph]; Physique Quantique [quant-ph]

K. Fahy, P. Dunne, L. Mckinney, G. O'Sullivan, E. Sokell, et al.. UTA versus line emission for EUVL: Studies on xenon emission at the NIST EBIT. Journal of Physics D: Applied Physics, 2004, 37, pp.3225-3232. ⟨hal-00005854⟩